Comparison ledger
Semitool 11600 SRD, YES R3A, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11600 SRDSemitool | R3AYES |
|---|---|---|
| OEM | Semitool | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Semitool 11600 SRD | YES R3A |
| Specifications | ||
| Configuration | Ceramic[1] | — |
| Manufacturer | Semitool[1] | — |
| Model | 11600 SRD[1] | — |
| Equipment type | Spin Rinse Dryer[1] | — |
| Model designation | — | Glen/YES R3A[2] |
| Alternate designation | — | YES-R3[2] |
| Series | — | R-Series plasma cleaning systems[2] |
| Position in series | — | smallest of the series[2] |
| Intended use | — | designed for pilot run quantities[2] |
| Sample trays | — | two 14 x 14 inch sample trays[2] |
| Total capacity | — | 390 square inches[2] |
| Power | — | 500W[3] |
| Frequency | — | 40kHz (low-frequency)[3] |
| Platen/Chamber Size | — | 14 x 14-inch, two-shelf configuration[3] |
| Operational Modes | — | Active Plasma, RIE, Downstream[3] |
| Process Type | — | Batch-process, low-frequency plasma cleaning[3] |
| Primary Application | — | Surface treatment including photoresist stripping (not primary use in Protofab)[3] |
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