Waferpedia

Comparison ledger

11600 SRDversusG500

Semitool 11600 SRD, YES G500, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
11600 SRDSemitool
G500YES
OEMSemitoolYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool 11600 SRDYES G500
Specifications
ConfigurationCeramic[1]—
ManufacturerSemitool[1]—
Model11600 SRD[1]YES-G500[2]
Equipment typeSpin Rinse Dryer[1]—
Category—Plasma Cleaning System[2]
Product line description—Plasma Cleaning Systems[3]
Shelves—2 powered shelves[3]
Type—Plasma Cleaning System[2]
Number of powered shelves—2[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]nanolab.berkeley.edunanolab.berkeley.edu
  3. [3]web.archive.orgweb.archive.org