Waferpedia

Comparison ledger

11600 SRDversus3302 Resist Removal and Wafer

Semitool 11600 SRD, SSEC 3302 Resist Removal and Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
11600 SRDSemitool
OEMSemitoolSSEC
CategoryWet Processing / CleanWet Processing / Clean
Wafer size—Wafer processing modules (2)
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool 11600 SRDSSEC 3302 Resist Removal and Wafer
Specifications
ConfigurationCeramic[1]—
ManufacturerSemitool[1]—
Model11600 SRD[1]—
Equipment typeSpin Rinse Dryer[1]—
Wafer size—Wafer processing modules (2)[2]
Voltage—220V, 3 Ph, 60 Hz, 30A[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing