Waferpedia

Comparison ledger

003163-000 SRDversusNS 300 + Wafer

Semitool 003163-000 SRD, Tokyo Electron NS 300 + Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
NS 300 + WaferTokyo Electron
OEMSemitoolTokyo Electron
CategoryWet Processing / CleanWet Processing / Clean
Wafer size—8"
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool 003163-000 SRDTokyo Electron NS 300
Cited variants—
Specifications
MakeSemitool[2]—
Model003163-000[2]NS 300 +[1]
Equipment typeSpin Rinse Dryer (SRD)[2]—
Asset #139375[2]—
Last Confirm DateSeptember 03, 2025[2]—
Configuration—8 chambers[1]
Wafer size—8" wafer[1]
Phase—1 phase[1]
Chemicals—TMY[1]
FOUP—4[1]
Power supply—Tel NSPB-E075-Y[1]
Process Type—Wet process[1]
Wafer Size—8 inch[1]
Number of Chambers—8[1]
FOUP Capacity—4[1]
Power Supply Model—Tel NSPB-E075-Y[1]
Phase (NS 300+)—1 phase[1]
Phase (NS 300)—3 phase[4]
Frequency (NS 300)—50/60Hz[4]
OEM—Tokyo Electron[1]
Tool type—Wafer Scrubber[1]
Chambers—8 chambers[1]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]inventory listing
  4. [4]inventory listing