Comparison ledger
Quintel Q 4000 Mask, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Q 4000 MaskQuintel | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Quintel | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Quintel Q 4000 Mask | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | Quintel Power Supply 365-405nm source; bottom shelve right side.[1] | — |
| Equipment type | Mask aligner[1] | — |
| Power supply source | 365-405nm source[1] | — |
| Mask holder | Fixed[1] | — |
| Split field objectives | With zoom capabilities[1] | — |
| Head lift exposure source | With zoom objectives[1] | — |
| Illumination control panel and vacuum/separation pressure gauge | Left side[1] | — |
| Joy stick 1 | Mask viewing manipulator; left side[1] | — |
| Joy stick 2 | Substrate manipulator; right side[1] | — |
| Theta substrate adjustor | Left side[1] | — |
| Objective focus switch / coarse align / contact separation button | Right side[1] | — |
| Parameter control display panel | Right side[1] | — |
| Power on switch | Right side[1] | — |
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