Comparison ledger
Perkin Elmer Lambda 750 Spectrophotometer, Perkin Elmer Lambda 750 UV-VIS-NIR, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Lambda 750 SpectrophotometerPerkin Elmer | Lambda 750 UV-VIS-NIRPerkin Elmer |
|---|---|---|
| OEM | Perkin Elmer | Perkin Elmer |
| Category | Precision Optics | Precision Optics |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Perkin Elmer Lambda 750 | Perkin Elmer Lambda 750 |
| Cited variants |
| — |
| Specifications | ||
| Operating System | Win7 Professional N[2] | — |
| Configuration | UV-VIS + NIR[2] | 50/60 Hz[4] |
| Principle | Double beam, double monochromator, ratio recording UV/Vis/NIR spectrophotometer with microcomputer electronics, controlled by a DELL PC or compatible personal computer.[3] | — |
| Optical System | All reflecting optical system (SiO2 coated) with holographic grating monochromator with 1440 Lines/mm UV/Vis blazed at 240 nm and 360 Lines/mm NIR blazed at 1100 nm, Littrow mounting, sample thickness compensated detector optics.[3] | — |
| Beam Splitting System | Chopper (46+ Hz, Cycle: Dark/Sample/Dark/Reference, Chopper Segment Signal Correction CSSC).[3] | — |
| Detector | Photomultiplier R955 for high energy in the whole UV/Vis wavelength range; Peltier cooled PbS detector for NIR.[3] | — |
| Source | Pre-aligned tungsten-halogen and deuterium.[3] | — |
| Wavelength Range | 190 nm - 3300 nm[3] | — |
| UV/Vis Resolution | ≤ 0.17 nm[3] | — |
| NIR Resolution | ≤ 0.20 nm[3] | — |
| Stray Light (at 200 nm, 12 g/L KCl USP/DAP method) | > 2 A ≤ 0.0001 %T[3] | — |
| Stray Light (at 220 nm, 10 g/L NaI ASTM method) | ≤ 0.0001 %T[3] | — |
| Wavelength Accuracy | ± 0.15 nm UV/Vis; ± 0.5 nm NIR[3] | — |
| Wavelength Reproducibility (UV/Vis, Deuterium Lamp Lines) | ≤ 0.1 nm[3] | — |
| Wavelength Reproducibility (NIR, Deuterium Lamp Lines) | ≤ 0.06 nm[3] | — |
| Photometric Accuracy (Double Aperture Method 1 A) | ± 0.0012 A[3] | — |
| Photometric Linearity (at 3.0 A, addition of filters UV/Vis at 546.1 nm, 2 nm Slit, 1-sec integration) | ± 0.020 A[3] | — |
| Photometric Range | 6 A (using reference-beam attenuation)[3] | — |
| Bandpass | 0.17 nm - 5.00 nm in 0.01 nm increments UV/Vis range; 0.20 nm - 20.00 nm in 0.04 nm increments NIR range[3] | — |
| Photometric Stability (after warm-up at 500 nm, 0 A, 2 nm Slit, 2-sec integration, Peak to Peak) | ≤ 0.0002 A/h[3] | — |
| Baseline Flatness (190 nm - 3100 nm, slit UV/Vis 2 nm, slit NIR Servo Mode) | ± 0.0015 A[3] | — |
| Photometric Noise RMS (0 A and 500 nm) | ≤ 0.00005 A[3] | — |
| Primary Sample Compartment (W x D x H) | 200 mm x 300 mm x 220 mm[3] | — |
| Secondary Sample Compartment (W x D x H) | 480 mm x 300 mm x 220 mm[3] | — |
| Instrument Dimensions (W x D x H) | 1020 mm x 740 mm x 300 mm[3] | — |
| Instrument Weight | ~ 77 kg[3] | — |
| Digital I/O | RS 232 C[3] | — |
| Light Beam (above base plate) | 90 mm; 120 mm beam separation; 3 mm - 12 mm beam height[3] | — |
| Power Requirements | 90 VAC - 250 VAC, 50/60 Hz; 400 VA[3] | — |
| Temperature Range | 10 °C - 35 °C[3] | — |
| Recommended Humidity | 10 - 70% relative humidity, non-condensing[3] | — |
| Voltage | — | 110 V[4] |
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