Comparison ledger
Oxford Instruments Plasmalab 100 Plus RIE, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Plasmalab 100 Plus RIEOxford Instruments | 1512eTegal |
|---|---|---|
| OEM | Oxford Instruments | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments Plasmalab 100 | Tegal 1512e |
| Specifications | ||
| Configuration | Load-locked System[1] | — |
| Tool type | Reactive ion etcher[1] | Industrial RIE plasma etcher system[3] |
| Category | Etch[2] | — |
| Wafer sizes | 2, 3, 4, 5, 6, 8, 12 inch[1] | — |
| System configuration | Load-locked system[1] | — |
| Gas module | Currently set up for Ar, O2, Cl2, and SiCl4; capable of 6 gases[1] | — |
| Included items | Computer, keyboard, new flat panel monitor, system chiller, turbo pump, load lock pump, operations manual and documentation[1] | — |
| Condition | Fully refurbished and meeting original specifications[1] | — |
| Stated configuration | — | With modules assembly for CI-4222[3] |
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