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March AP 300 alternatives
Comparable Etch equipment documented in the Waferpedia catalog.
6 comparable tools
Lam Research
4520 Oxide
Etch
The Lam Research 4520 Oxide Etch is a single-wafer, vacuum load-locked low-pressure plasma etch system designed for oxide etching, including contact etch and planarization, for wafers up to 200 mm.
SPTS
CPX Pegasus
Etch
The SPTS / STS CPX Pegasus is an etcher with 8-inch wafer support and a two-chamber configuration.
Lam Research
TCP 9600 SE Metal
Etch
The Lam TCP 9600 SE Metal Etch is a plasma etch system for metal layers on 6-inch and 8-inch wafers.
Applied Materials
0010 47763
Etch
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
Applied Materials
0010-16392 ESC Assembly
Etch
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.
Applied Materials
0041-39086 ESC Part
Etch
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