Comparison ledger
Nikon Scanner 204 B, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Scanner 204 BNikon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon Scanner | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 0.15um[1] | — |
| Make | Nikon[1] | — |
| Model | Scanner 204 B[1] | — |
| Equipment type | Stepper[1] | — |
| Wafer sizes | 6, 8 inch[1] | — |
| Resolution | 0.15 µm[1] | — |
| Vintage | 2005[1] | — |
| Category | Lithography[2] | — |
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