Nikon

NSR 2205 i 14 E 2 i-Line alternatives

LinkedIn X Email

Comparable Lithography equipment documented in the Waferpedia catalog.

Nikon NSR 2205 i 14 E 2 i-Line entry →All Lithography tools →

6 comparable tools

ASML
PAS 5500
200mm
Lithography
The ASML PAS 5500/275D is a high-throughput i-line stepper with 5X reduction, 365 nm exposure, and automated wafer handling for substrates up to 200 mm diameter.
GCA
AS200
200mm
Lithography
The GCA AutoStep 200 DSW (also known as AS200) is a 5X reduction i-line wafer stepper designed for up to 200mm wafers.
SUSS MicroTec
BA8 Gen4 Pro
200mm
Lithography
The SUSS MicroTec BA8 Gen4 Pro is a semi-automated mask alignment and wafer bonding system for 200 mm wafers, with capabilities including exposure, UV bonding, fusion bonding, imprinting, and selective plasma activation.
SUSS MicroTec
MA200 Gen3
200mm
Lithography
The SUSS MicroTec MA200 Gen3 is a fully automated mask aligner for high-volume lithography on wafers and square substrates up to 200 mm.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.

Compare interactively

Need a side-by-side spec table? Open the compare tool to pick any two models.

Compare NSR 2205 i 14 E 2 i-Line with another model →