Comparison ledger
Nikon NSR 2205 i 11 C i-Line, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 2001– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR 2205 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 0.40um[1] | — |
| Resolution | 0.45um L&S[2] | — |
| Total Focus Deviation | 0.45um L&S[2] | — |
| Astigmatism | 0.35um L&S[2] | — |
| Inclination | 0.40um[2] | — |
| Lens Distortion | 0.55um[2] | — |
| Mag Control Accuracy | 0.25um[2] | — |
| Focus Control Accuracy | 0.2um[2] | — |
| Wafer Size | 6 inch, 8 inch[1] | — |
| Resolution (L&S) | 0.45 µm[2] | — |
| Total Focus Deviation (L&S) | 0.45 µm[2] | — |
| Astigmatism (L&S) | 0.35 µm[2] | — |
| Magnification Control Accuracy | 0.25 µm[2] | — |
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