Comparison ledger
Laurell EDC-650-8 B, Laurell H6-8 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | EDC-650-8 BLaurell | H6-8 BLaurell |
|---|---|---|
| OEM | Laurell | Laurell |
| Category | Resist Processing | Resist Processing |
| Wafer size | 200mm | 200mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Laurell EDC-650-8 B | Laurell H6-8 B |
| Specifications | ||
| OEM | Laurell[1] | — |
| Model | EDC-650-8 B[1] | — |
| Model type | EDC System[1] | — |
| Controller | 650-series[1] | 650-series[1] |
| Max. substrate size | ø 200mm (7" × 7")[1] | — |
| Max. RPM | 12000 rpm[1] | 12000 rpm[1] |
| Mounting options | Tabletop, In-Deck, On-deck[1] | — |
| Type | — | Spin Coater[1] |
| Max. Substrate Size | — | 200mm (7" x 7")[1] |
| Mounting Options | — | Tabletop, In-Deck, On-deck[1] |
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