Comparison ledger
KLA .498 PSL Wafer, Zeiss Axiotron 300, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Axiotron 300Zeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .498 PSL Wafer | Zeiss Axiotron 300 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | NIST Traceable[2] | — |
| NIST traceability | Yes[2] | — |
| Wafer size (max) | — | 300 mm (12 inch)[3] |
| Supported wafer sizes | — | 200 mm, 300 mm[4] |
| Observation modes | — | Brightfield (VIS and 337 nm UV), darkfield, DIC (Nomarski), CSM[4] |
| Stage | — | Newport Kensington XY stage, 300 mm x 300 mm travel, 300 mm vacuum wafer chuck[4] |
| Objectives (partial list) | — | Epiplan Neofluar 10x/0.30 HD DIC, Epiplan Apochromat 50x/0.90 HD DIC, 100x/0.95 HD DIC, 150x/0.95, Epiplan UV Insp 120x/0.95[4] |
| Cameras | — | TI MP-2000PF-U5 camera, Optronix S97670 camera with DEI-750D controller[4] |
| Illumination source | — | Hg-Xe lamp source, Zeiss LG-Xe 180W remote xenon illumination[4] |
| Laser autofocus | — | Zeiss 45 74 92 dual beam laser autofocus assembly[4] |
| UV laser | — | Thermo VSL-337ND-S 337 nm nitrogen laser[4] |
| Vibration isolation | — | Halcyonics (Accurian) MOD-2M active vibration isolation controller[4] |
| Operating system | — | MS Windows 2000 Professional[4] |
| Load ports | — | 2 units of Brooks load port[5] |
| Make | — | Zeiss[3] |
| Model | — | Axiotron 300[3] |
| Tool family | — | Zeiss Axiotron 300 AOI[1] |
| Equipment type | — | AOI microscope[5] |
| Wafer sizes | — | 12 inch[3] |
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