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Comparison ledger

.496 PSL WaferversusNEXIV VMZ R 3020

KLA .496 PSL Wafer, Nikon NEXIV VMZ R 3020, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMKLANikon
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA .496 PSL WaferNikon NEXIV VMZ R 3020
Cited variants—
Specifications
ConfigurationNIST Traceable[2]—
Wafer size8 inch[2]—
TraceabilityNIST Traceable[2]—
Compatible systemsCapable on Surfscan 6xy0 and SP1[2]—
CategoryMetrology & Inspection[3]—
Model—NEXIV VMZ R 3020[4]
Stroke—300 x 200 x 200 mm[1]
Stroke (low magnification, type TZ)—250 x 200 x 200 mm[1]
Minimum readout—0.01 μm[1]
Maximum workpiece weight—20 kg[1]
Measuring uncertainty EUX, MPE EUY, MPE—1.2+4L/1000 μm[1]
Measuring uncertainty EUXY, MPE—2+4L/1000 μm[1]
Z measurement uncertainty EUZ, MPE—1.2+5L/1000 μm (with Laser AF)[1]
Camera—Black & white 1/3" CCD, color 1/3" CCD (option) for type 1, 2 and A only[1]
Power source—AC 100-240V 50/60Hz[1]
Power consumption—5A-2.5A[1]
Dimensions (main unit & table)—700 x 730 x 1795 mm[1]
Weight (main unit & table)—245 kg[1]
Dimensions (controller)—190 x 450 x 440 mm[1]
Weight (controller)—15 kg[1]
Footprint—2100 x 1100 mm[1]
Vintage—2016[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]exceltechnologies.comexceltechnologies.com
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]Equipment inventory listing