Comparison ledger
Hitachi S 9300 CD-SEM, KLA .498 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | S 9300 CD-SEMHitachi | |
|---|---|---|
| OEM | Hitachi | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | Wafer imaging ability; entire surface of 8” or 12” wafer | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi S 9300 CD-SEM | KLA .498 PSL Wafer |
| Specifications | ||
| Configuration | 2 cassette holders with ergo flippers[1] | NIST Traceable[3] |
| Electron Gun | Schottky emission source[1] | — |
| Accelerating voltage | 500V to 1600V, 10V steps[1] | — |
| Probe Current | 4~24 pA with automated setting and measurement by Faraday cup[1] | — |
| Electromagnetic Lens | 3-Stage Electromagnetic Lens System with boosting voltage[1] | — |
| Objective Lens | 4 opening click stop, heated aperture is selectable/adjustable outside the vacuum[1] | — |
| Scan Coil | 2-Stage Electromagnetic Deflection[1] | — |
| Wafer size | Wafer imaging ability; entire surface of 8” or 12” wafer[1] | — |
| Depth of focus | ≥ 1.0 um at 80000x magnification[1] | — |
| Resolution | 3 nm (800V) Retarding/Boosting Mode[1] | — |
| Magnification | 1000x to >300000x[1] | — |
| Wafer Imaging | entire surface of 8” or 12” wafer[1] | — |
| Workstation | HP B180L with HP-UX 10.20 or newer[1] | — |
| Field of View | 1.2 mm[1] | — |
| Model | HP B180L (9GB)[1] | — |
| O/S | Unix version HP-UX 10.20 or newer[1] | — |
| Software Version | 14.71 or newer[1] | — |
| Tool type | Critical Dimension Scanning Electron Microscope (CD-SEM)[1] | — |
| Wafer size support | 8 inch[1] | — |
| Wafer imaging ability | Entire surface of 8" or 12" wafer[1] | — |
| Category | Metrology & Inspection[2] | — |
| NIST traceability | — | Yes[3] |
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