Waferpedia

Comparison ledger

1305 BSG 3versusClean Track Lithius Pro Z i Resist

Hitachi 1305 BSG 3, Tokyo Electron Clean Track Lithius Pro Z i Resist, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1305 BSG 3Hitachi
OEMHitachiTokyo Electron
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHitachi 1305 BSG 3Tokyo Electron Clean Track
Specifications
Configuration—Multi Block[1]
T&H Controller—Customer Provided[1]
Chemical Filter—Customer Provided[1]
Ingenio GL License—OEM Support/Buyer[1]
DEV—PTD:[1]
DEV Nozzle—MGP[1]
Rinse Nozzle—ADR Nozzles[1]
NTD Nozzle—IDN Nozzle[1]

Plan your fab

Building a Wet Processing / Clean process? Get a complete equipment list.

Open the fab equipment planner →
Sources (1)Every fact above is drawn from these public sources
  1. [1]inventory listing