Comparison ledger
GCA 6100 C Wafer, Karl Suss MA-4, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 6100 C WaferGCA | MA-4Karl Suss |
|---|---|---|
| OEM | GCA | Karl Suss |
| Category | Lithography | Lithography |
| Wafer size | 100mm | 100mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | GCA 6100 C Wafer | Karl Suss MA-4 |
| Specifications | ||
| Configuration | Maximus 1000 Light Source (350w)[1] | — |
| Wafer size | 100 mm AWH1 (Automatic Wafer Handler)[1] | — |
| Lens | 10X g-line (436), NA=0.28[1] | — |
| Equipment Rack | (Top Down)[1] | — |
| Make | GCA[1] | — |
| Model | 6100 C[1] | MA-4[3] |
| Category | Lithography[2] | — |
| Wafer handling | AWH1 (Automatic Wafer Handler)[1] | — |
| Stage travel | 150 mm X/Y stage travel[1] | — |
| Optics | 10X g-line (436), NA=0.28[1] | — |
| Light source | Maximus 1000 Light Source (350w)[1] | — |
| Controller | RZE PC Upgrade Controller (v605.1 Operating System)[1] | — |
| Alignment monitor | Alignment Monitor & PC Monitor[2] | — |
| OEM | — | Karl Suss[3] |
| Equipment type | — | Mask Aligner[3] |
| Substrate size | — | Up to 4" (100mm) in diameter[3] |
| Sample compatibility | — | Works for smaller samples[3] |
| Alignment mode | — | Contact/proximity aligner[3] |
| Illumination wavelengths | — | 365 nm or 405 nm[3] |
| Backside alignment | — | Real-time infrared through-wafer backside alignment[3] |
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