Comparison ledger
Filmetrics F50-UV, KLA .204 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | F50-UVFilmetrics | |
|---|---|---|
| OEM | Filmetrics | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | 8" | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Filmetrics F50-UV | KLA .204 PSL Wafer |
| Specifications | ||
| Vendor | Filmetrics[1] | — |
| Model | Filmetrics F50-UV[1] | — |
| Measurement method | spectroscopic reflectometry[2] | — |
| Function | thin-film thickness and optical characteristics measurement[1] | — |
| Automated stage | yes[1] | — |
| Sample size | up to 8 inches in diameter[1] | — |
| Substrate size | ~5 mm × 5 mm to 200 mm diameter[2] | — |
| Thickness measurement range | 5 nm – 40 µm[2] | — |
| Minimum thickness to measure n and k | 50 nm[2] | — |
| Wavelength range | 190–1100 nm[2] | — |
| Spot size | 1.5 mm[2] | — |
| Light source | deuterium + tungsten-halogen (dual light source; may choose one or both lamps)[2] | — |
| Measurement results visualization | 2D and 3D[2] | — |
| Measurement results visualisation | 2D and 3D[2] | — |
| Wafer handling | Up to 8"[1] | — |
| Sample stage | Fully automated[1] | — |
| Measurement rate | up to 2 points per second[1] | — |
| Configuration | — | NIST Traceable[3] |
| Wafer Size | — | 8 inch[3] |
| Traceability | — | NIST[4] |
| Compatible Tools | — | Surfscan 6xy0, Sp1[3] |
| NIST Traceable | — | Yes[3] |
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