Comparison ledger
Filmetrics F20-EXR, Filmetrics F30, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | F20-EXRFilmetrics | F30Filmetrics |
|---|---|---|
| OEM | Filmetrics | Filmetrics |
| Category | thin-film thickness measurement instrument | thin-film thickness measurement instrument |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Filmetrics F20-EXR | Filmetrics F30 |
| Specifications | ||
| Measurement method | spectral reflectance[1] | — |
| Wavelength range | 400-1700 nm[1] | — |
| Analysis mode | one-click analysis of ITO thickness[1] | — |
| Model context | uses a new ITO dispersion model[1] | — |
| measurement method | — | spectral reflectance system[2] |
| measurements | — | deposition rates, layer thickness, optical constants (n and k), and uniformity[2] |
| target materials | — | semiconductors and dielectric layers[2] |
| measurement context | — | real-time thin-film deposition monitoring[2] |
| film types mentioned | — | smooth and translucent, or lightly absorbing films[2] |
| example materials | — | virtually any semiconducting material, from AlGaN to GaInAsP[2] |
| software | — | Intuitive Windows software[2] |
| Instrument type | — | In-situ thickness measurement instrument[3] |
| Measures | — | Deposition rates, film thickness, optical constants (n and k), and uniformity[3] |
| Observed materials | — | Semiconductors and dielectric layers[3] |
| Operating context | — | Totally outside of deposition chamber[2] |
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