Waferpedia

Comparison ledger

520versus1 WBS 1 Wafer Substrate

EV Group 520, Logitech 1 WBS 1 Wafer Substrate, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
520EV Group
OEMEV GroupLogitech
CategoryPackaging & BondingPackaging & Bonding
Wafer sizeManual wafer load substrate bonder—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyEV Group 520Logitech 1 WBS 1 Wafer Substrate
Cited variants—
Specifications
ConfigurationRefurbished[2]—
Phase3 Phase[2]—
Wafer sizeManual wafer load substrate bonder[2]—
Wafer Sizeup to 150 mm capable[2]6 inch[3]
Vacuum Chuck6"/150mm diameter chuck[2]—
Max Bond Force7 kN[2]—
Top Side Heater550°C max. in 1°C steps[2]—
Bottom Side Heater550°C max. in 1°C steps[2]—
Temperature uniformity± 1,5 %[2]—
OEMEV Group[2]—
Model520[2]—
Load typeManual wafer load substrate bonder[2]—
Wafer size (as configured)6 inch[2]—
Wafer size capabilityup to 150 mm capable[2]—
Max bond force (configured system)7 kN[2]—
Top side heater max temperature550°C max. in 1°C steps[2]—
Bottom side heater max temperature550°C max. in 1°C steps[2]—
Power requirements50 / 60 Hz - 120 / 208 V - 3 Phase[2]—
Bonding capability (configured system)Fusion & thermal compression bonding; anodic bonding[2]—
Bond chamberHigh-vacuum capable bond chamber[2]—
Bond tool coverAuto opening of bond tool cover[2]—
Control softwareWindows based control software and operation interface[2]—
ChillerThermoflex 1400 Chiller (or equivalent)[2]—
PumpingTurbo pump and controller; roughing pump[2]—
System configuration (EVG520 IS)Single or dual chamber wafer bonding system[1]—
Automation (EVG520 IS)Fully automated processing with manual loading and unloading including external cooling station[1]—
Aligner compatibility (EVG520 IS)Compatible with EVG mechanical and optical aligners[1]—
Chambers (EVG520 IS)Single- or double-chamber automated system[1]—
Cooling (EVG520 IS)Integrated cooling station for high throughput; active water cooling top and bottom; integrated cooling optional[1]—
Max contact force (EVG520 IS)10, 20, 60, 100 kN[1]—
Heater size (EVG520 IS)150 mm, 200 mm[1]—
Minimum substrate dimension (EVG520 IS)single chips 100 mm[1]—
Vacuum standard (EVG520 IS)1E-5 mbar[1]—
Vacuum optional (EVG520 IS)1E-6 mbar[1]—
Max temperature (EVG520 IS)Standard: 550 °C; Optional: 650 °C[1]—
Single chips processing (EVG520 IS)Yes[1]—
Loading chamber (EVG520 IS)Manual[1]—
Max bond chambers (EVG520 IS)2[1]—
Anodic bonding power supply (EVG520 IS)Max. voltage: 2 kV; max. current: 50 mA[1]—
Chuck / alignment systems (EVG520 IS)150 mm heater: EVG 610, EVG 620, EVG 6200; 200 mm heater: EVG 6200, SmartView NT[1]—

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Sources (3)Every fact above is drawn from these public sources
  1. [1]evgroup.comevgroup.com
  2. [2]inventory listing
  3. [3]Equipment inventory listing