Comparison ledger
EV Group 101, OAI 806 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | 806 MaskOAI |
|---|---|---|
| OEM | EV Group | OAI |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | OAI 806 Mask |
| Cited variants | — |
|
| Specifications | ||
| OEM | EV Group[2] | OAI[5] |
| Model | 101[2] | 806[5] |
| Equipment name | EVG 101 Spray Coater[2] | — |
| NEMO ID | evgspraycoat[2] | — |
| Training required | EVG 101 Training[2] | — |
| Training duration | 1.50 hours[2] | — |
| Processing technique | Resist Spray Coat (manual)[2] | — |
| Cleanliness | "All"[2] | — |
| Location | SNF Paul G Allen L107 Cleanroom[2] | — |
| Wafer diameter (substrate size) | up to 300 mm[3] | — |
| Available modules | Spin coat / OmniSpray® / develop[3] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[3] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[3] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[4] | — |
| Cleanliness group (at SNF) | "All"[2] | — |
| Wafer size | — | 6 inch[5] |
| Model variant | — | MBA 806[1] |
| Alignment accuracy | — | submicron[6] |
| Light source | — | collimated UV light source, 350W NUV lamphouse[6] |
| Workholding | — | vacuum chuck[6] |
| Microscope | — | integrated microscope optics with 5x objectives[6] |
| Stage | — | motorized stage with Thomson Industries Quickslide System[1] |
| Contact modes | — | soft, hard, and proximity contact[6] |
| Backside alignment | — | optional[6] |
| Wafer loading | — | manual[1] |
| Mask holders | — | 4 inch (3 inch round opening), 5 inch (4 inch round opening), 7 inch (6 inch round opening)[1] |
| BSA chucks | — | 3 inch, 4 inch, and 6 inch[1] |
| Tool type | — | Mask Aligner[5] |
| Exposure modes | — | soft contact, hard contact, and proximity contact modes[6] |
| Optical source | — | collimated UV light source[6] |
| Alignment optics | — | integrated microscope optics[6] |
| Model designation | — | MBA806[1] |
| Manual wafer load | — | manual wafer load mask aligner[1] |
| Lamphouse | — | 350W NUV lamphouse[1] |
| Microscope light power supply | — | included[1] |
| Objectives | — | 5x objectives[1] |
| System | — | Thomson Industries Quickslide System[1] |
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