Comparison ledger
EV Group 101, Karl Suss MA6/BA6, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | MA6/BA6Karl Suss |
|---|---|---|
| OEM | EV Group | Karl Suss |
| Category | Lithography | Lithography |
| Wafer size | — | Samples ranging in size from 10mm to 150mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Karl Suss MA6/BA6 |
| Specifications | ||
| OEM | EV Group[1] | Karl Suss[4] |
| Model | 101[1] | MA6/BA6[4] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Category | — | Frontside/Backside Mask Aligner[5] |
| Application | — | For topside or backside photo alignment and exposure[4] |
| Backside alignment | — | Equipped with backside align capability with automated image capture and computer display optics[5] |
| Exposure wavelengths | — | 350-450nm[5] |
| Lamp house | — | 350W lamp house containing a 350W mercury short-arc lamp[5] |
| Exposure modes | — | Hard contact, soft contact, proximity, and vacuum contact[5] |
| Resolution | — | Line/space resolution of <1.0 microns under optimum conditions[5] |
| Alignment accuracy | — | 0.25 microns under optimum conditions[5] |
| Constant intensity control | — | Constant intensity controller (CIS) regulates lamp power to deliver constant intensity exposures[5] |
| Sample size range | — | 10mm to 150mm[5] |
| Mask size range | — | 4" to 7" sq.[5] |
| Minimum mask thickness | — | .09"[5] |
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