Comparison ledger
Bruker Dektak XT, KLA 1.112 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Dektak XTBruker | |
|---|---|---|
| OEM | Bruker | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | 2 in, 4 in, 6 in, 8 in | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Bruker Dektak | KLA 1.112 PSL Wafer |
| Specifications | ||
| Configuration | 4" Stage and movement controlled by software[1] | NIST Traceable[3] |
| Stylus diameter | 12.5 Microns[1] | — |
| Measurement type | Stylus surface profiler for thin and thick film step height[2] | — |
| Wafer compatibility | 2 in, 4 in, 6 in, 8 in[2] | — |
| Magnification / Field of View | Selectable 1 to 4 mm FOV[2] | — |
| Scan length range | 55 mm (with stitching option)[2] | — |
| Vertical range | 1 mm[2] | — |
| Step-height repeatability | 5 Å[2] | — |
| Low force (N-Lite+) | 0.03 to 15 mg[2] | — |
| 3D capabilities | 3D stress and 3D mapping[2] | — |
| Compatible wafer sizes | 2", 4", 6", 8"[2] | — |
| Selectable magnification | 1 to 4mm FOV[2] | — |
| N-Lite+ Low Force | 0.03 to 15mg[2] | — |
| 3D stress and 3D mapping | Supported[2] | — |
| Tool Type | Stylus surface profiler[2] | — |
| Wafer Compatibility | 2″, 4″, 6″, 8″ wafers[2] | — |
| Field of View Magnification | Selectable, 1 to 4mm FOV[2] | — |
| Type | stylus surface profiler[2] | — |
| Measurement purpose | advanced thin and thick film step height measurement[2] | — |
| Low force mode | N-Lite+ Low Force with 0.03 to 15mg[2] | — |
| Measurement modes | 3D stress and 3D mapping[2] | — |
| Wafer Size | — | 8 inch[3] |
| NIST Traceable | — | True[3] |
| Compatible Tools | — | Surfscan 6xy0 and Sp1[4] |
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