Waferpedia

Comparison ledger

017-0146-01 PrealignerversusNSR SF 155 i-Line

Brooks 017-0146-01 Prealigner, Nikon NSR SF 155 i-Line, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMBrooksNikon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0146-01 PrealignerNikon NSR
Specifications
Configuration—SMIF / FOUP[1]
Load Module—SEMES EFEM[1]
Nikon Lens—SRI 12 M 4 IL 2 SS[1]
Reticle Size—6 inch[1]
Wafer Type—Notch[1]
Inline Flow—In-Line[1]
Alignment System—FIA Modification for Colored Resist[1]
WL Type—12 inch[1]
Mercury Lamp—7.5 KW (SUV 7500 NI)[1]
LLTC TeompSetting—23 Deg C[1]
Exposure Wavelength—i-line (365 nm)[2]
Light Source—Mercury lamp[2]
Reduction Ratio—5×[2]
Resolution—≥0.5 µm[2]
Wafer Sizes (standard)—150 mm (6 inch) and 200 mm (8 inch)[2]
Stage System—Precision XY wafer stage with closed-loop positioning[2]
Operating System—Windows[1]
PM1—UV Lamp[1]
PM2—Stage[1]

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]junr.com.cnjunr.com.cn