Waferpedia

Comparison ledger

017-0024-01 Prealignerversus6200 NT

Brooks 017-0024-01 Prealigner, EV Group 6200 NT, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
6200 NTEV Group
OEMBrooksEV Group
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0024-01 PrealignerEV Group 6200 NT
Cited variants—
  • EVG6200 NT Gen2[1]
Specifications
Voltage—200V[2]
Manufacturer—EV Group[3]
Model—6200 NT[3]
Tool type—Bond Aligner[3]
Configuration—Semi-automated or automated[1]
Wafer/substrate size—Up to 200 mm / 8 in[1]
Exposure source—Mercury light source / UV LED light source[1]
Exposure source options—Mercury lamp or UV LED lamp source[4]
Alignment accuracy—Top side alignment: ≤ ±0.5 µm; bottom side alignment: ≤ ±1.0 µm; IR alignment: ≤ ±2.0 µm; bond alignment: ≤ ±2.0 µm; NIL alignment: ≤ ±3.0 µm[1]
Throughput—Up to 180 WPH in first print mode; up to 140 WPH in automatic alignment mode[1]
Exposure modes—Vacuum contact / hard contact / soft contact / proximity / curved surface[5]
System control—Windows-based[5]
Multi-language user GUI and support—CN, DE, FR, IT, JP, KR[1]
Additional capabilities—Bond alignment, IR alignment, Nanoimprint lithography (NIL), SmartNIL[1]

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (5)Every fact above is drawn from these public sources
  1. [1]evgroup.comevgroup.com
  2. [2]inventory listing
  3. [3]Equipment inventory listing
  4. [4]evgroup.comevgroup.com
  5. [5]instrumenthive.cominstrumenthive.com