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Comparison ledger

017-0024-01 Prealignerversus5500 iZA

Brooks 017-0024-01 Prealigner, Canon 5500 iZA, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMBrooksCanon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0024-01 PrealignerCanon 5500 iZA
Cited variants—
Specifications
Model type—i-Line (365nm) Stepper[2]
Wafer size—300mm; 200mm[2]
Resolution—≤0.35μm[2]
Numerical Aperture (NA)—0.45 ~ 0.57[2]
Reticle size—6in. (0.25in. thick)[2]
Reduction ratio—4:1[2]
Field size—26mm x 33mm[2]
Overlay accuracy—≤ 16nm (M+3)[2]
Throughput—≥93wph (300mm); ≥155wph (200mm)[2]
Exposure wavelength—i-line (365nm)[2]
Lamp—4.5kW high-pressured mercury lamp[2]
Overlay accuracy achieved—16nm through reticle magnification compensation and through improvements in Z and tilt compensation accuracy, stage environment control accuracy, and calibration accuracy[2]
Platform—FPA-5000 platform[2]
Manufacturer—Canon[3]
Model—5500 iZA[3]
Tool type—i-line stepper lithography system[1]
Last confirmed date—August 22, 2023[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]generalmanual.comgeneralmanual.com
  3. [3]Equipment inventory listing