Waferpedia

Comparison ledger

200 PCU Photoresist StabilizerversusRC 16 Spin

Axcelis 200 PCU Photoresist Stabilizer, SUSS MicroTec RC 16 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

LinkedIn X Email
Side-by-side comparison of selected equipment models
Attribute
200 PCU Photoresist StabilizerAxcelis
RC 16 SpinSUSS MicroTec
OEMAxcelisSUSS MicroTec
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200SUSS MicroTec RC 16 Spin
Specifications
Configuration14 Amps[1]—
Voltage380 V[1]—
Frequency50 Hz[1]—
Phase3 Phase[1]—
200 PCU Photoresist Stabilizer entryRC 16 Spin entryAsk about these tools →Share experience with this comparison →

Plan your fab

Building a Resist Processing process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing