Waferpedia

Comparison ledger

200 ACUversusTactras RLSA

Axcelis 200 ACU, Tokyo Electron Tactras RLSA, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
200 ACUAxcelis
Tactras RLSATokyo Electron
OEMAxcelisTokyo Electron
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200Tokyo Electron Tactras RLSA
Specifications
ConfigurationParts Machine[1]Oxide, Nitride, Polysilicon[5]
ManufacturerAxcelis[1]—
Model200 ACU[1]—
Tool typeAsher[1]—
Wafer size200mm[3]—
Serial numberAU6A356AH[3]—
Computer systemM 200 PC, M 200[4]—
Part numberSC 4572 A[4]—
Volts208[4]—
Amps30[4]—
Equipment typeAsher[1]—
Wafer configuration8 inch[2]—
Chamber Type—Polysilicon Dry Etch Chamber[6]
Wafer Size—300mm[7]
Microwave Generator—Nihon Koshuha Microwave Generator, Model MKS 050B04C-OSC-V[8]
Turbo Pump—SHIMADZU FT2301D[8]
Top Generator—MKS-050B04 PS-V[8]
Bottom Generator—Daihen RGA-20C[8]
Gas Box Configuration—N2, TSA, Ar, H2, NF3, SiH4[8]
Chuck—ESC with Dual He Cooling[8]

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Sources (8)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]wotol.comwotol.com
  4. [4]semistarcorp.comsemistarcorp.com
  5. [5]inventory listing
  6. [6]wotol.comwotol.com
  7. [7]macquarie.commacquarie.com
  8. [8]solutions-on-silicon.comsolutions-on-silicon.com