Waferpedia

Comparison ledger

Twinscan XT 1700 i Immersionversus1000 Family

ASML Twinscan XT 1700 i Immersion, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1000 FamilyUltratech
OEMASMLUltratech
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyASML Twinscan XT 1700Ultratech 1000 Family
Specifications
Configuration193nm[1]—
TypeImmersion scanner[1]—
Wavelength193 nm[1]—
Node45 nm[1]—
Throughput122 wafers per hour[1]—
Vintage2006[1]—
Tool type—Photolithography step-and-repeat 1X stepper[2]
Optical design—Wynne Dyson[2]
Magnification—1X[2]

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]en.wikipedia.orgen.wikipedia.org