Comparison ledger
ASML Twinscan NXT 1980 Di Immersion, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML Twinscan NXT 1980 Di Immersion | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Manufacturer | ASML[1] | — |
| Model | Twinscan NXT 1980 Di[1] | — |
| Category | Lithography[2] | — |
| Wafer size | 12 inch[1] | — |
| Platform architecture | NXT3 immersion technology[4] | — |
| Overlay accuracy | <1.5 nm (3σ)[4] | — |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →