Comparison ledger
ASML TWINSCAN NXE:3800E, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1000 FamilyUltratech | |
|---|---|---|
| OEM | ASML | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | 2 nm Logic nodes and leading-edge DRAM nodes | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML TWINSCAN NXE:3800E | Ultratech 1000 Family |
| Specifications | ||
| lightSource | 13.5 nm EUV[1] | — |
| numericalAperture | 0.33[1] | — |
| stageType | dual-stage[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[2] |
| Optical design | — | Wynne Dyson[2] |
| Magnification | — | 1X[2] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →