Comparison ledger
Applied Materials PI 9500 Ion, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PI 9500 IonApplied Materials | 160 XP IonVarian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | Wafer Loader Blade Control PCB | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials PI 9500 | Varian 160 XP Ion |
| Specifications | ||
| Configuration | Belt Drive[1] | 150mm High Current IMP[2] |
| Frequency | 60 Hz[1] | — |
| Utilities | Top feed[1] | — |
| Water fittings | Imperial[1] | — |
| Remote distance | 6m umbilical[1] | — |
| Layout | Thru wall[1] | — |
| Wafer cassette | 26 wafers[1] | — |
| Helium line length | 15 m[1] | — |
| Factory interface | SECS / GEM[1] | — |
| Tilt angle | Variable 0-7 degree[1] | — |
| Plasma Flood System | HDPFS[1] | — |
| Beamline | Standard[1] | — |
| Source type | Bernas[1] | — |
| Front plate | Tungsten[1] | — |
| Extraction type | Single bellows[1] | — |
| Make | Applied Materials[1] | — |
| Model | PI 9500[1] | 160 XP Ion[3] |
| Equipment type | Ion Implanter[1] | — |
| Wafer Sizes | 6 inch[1] | — |
| Drive | Belt Drive[1] | — |
| Pumps | Leybold Turbo pumps; Ebara A07V Mech pump; CTI Cryo pump[1] | — |
| Standard wheel | 25 wfr wheel[1] | — |
| Source chamber liners | Included[1] | — |
| MRS Chamber Liners | Included[1] | — |
| Gas position 1 | Boron (gas module missing)[1] | — |
| Gas position 2 | n/a (gas module missing)[1] | — |
| Gas position 3 | Phosphine[1] | — |
| Gas position 4 | Arsine[1] | — |
| Wafer size | Wafer Loader Blade Control PCB[1] | — |
| OEM | — | Varian[3] |
| Category | — | Ion Implantation[2] |
| Tool type | — | ion implanter[2] |
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