Comparison ledger
Applied Materials Centura RTP, CEE 1000 Hot Plate, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Centura RTPApplied Materials | |
|---|---|---|
| OEM | Applied Materials | CEE |
| Category | Thermal / Diffusion | Thermal / Diffusion |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2008 Vintage | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Centura | CEE 1000 Hot Plate |
| Specifications | ||
| Configuration | (1)x DPN[1] | 4"[2] |
| Wafer Sizes | 12 inch[1] | — |
| Chamber Configuration | 1x DPN, 2x RTP[1] | — |
| Vintage | 2008[1] | — |
| Type | — | Hot Plate[2] |
| Wafer Size | — | 4 inch[2] |
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