Comparison ledger
Applied Materials Centura eMXP+, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Centura eMXP+Applied Materials | 1512eTegal |
|---|---|---|
| OEM | Applied Materials | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Centura | Tegal 1512e |
| Specifications | ||
| Configuration | Oxide[1] | — |
| Software Version | E4.8_26[1] | — |
| Voltage | 208 VAC[1] | — |
| Full load current | 240A[1] | — |
| Frequency | 50/60 Hz[1] | — |
| Process | Nitride Spacer[1] | — |
| Wafer size | 8 inch[1] | — |
| Robot | HP+ Robot[1] | — |
| Excludes | LPT, Chiller, Dry Pump[1] | — |
| Tool type | — | Industrial RIE plasma etcher system[2] |
| Stated configuration | — | With modules assembly for CI-4222[2] |
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