Waferpedia

Comparison ledger

0041-39086 ESC Partversus80s

Applied Materials 0041-39086 ESC Part, Oxford Instruments 80s, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
80sOxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Oxford Instruments 80s
Specifications
Process Type—Reactive Ion Etching (RIE)[1]
Configuration—Open load[1]
Gas Chemistry—Fluorocarbon gases[1]
Primary Application—Etching of silicon based films[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]cnf.cornell.educnf.cornell.edu