Waferpedia

Comparison ledger

0041-39086 ESC Partversus9600 TCP Metal

Applied Materials 0041-39086 ESC Part, Lam Research 9600 TCP Metal, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
9600 TCP MetalLam Research
OEMApplied MaterialsLam Research
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Lam Research TCP 9600
Specifications
Configuration—with 3 HALO generators[1]
Plasma source—Transformer Coupled Plasma (TCP)[2]
Wafer size compatibility—6-inch (150mm) and 8-inch (200mm)[2]
Chuck type—Ceramic ESC with helium backside cooling[2]
Endpoint control—Optical Emission Spectroscopy (OES)[2]
Automation interface—SECS/GEM Protocol[2]
Process chamber—Anodized aluminum, quartz-lined[2]
Typical etch targets—Al, TiN, Cu, W, Oxide, Nitride, Poly[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]junr.com.cnjunr.com.cn