Waferpedia

Comparison ledger

0020 18698 PartversusDesktop Pro

Applied Materials 0020 18698 Part, Denton Vacuum Desktop Pro, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18698 PartApplied Materials
Desktop ProDenton Vacuum
OEMApplied MaterialsDenton Vacuum
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18698 PartDenton Vacuum Desktop Pro
Specifications
ConfigurationDial Cover, Side Local Match, Hdpcvd, Ul[1]50/60 Hz[2]
Voltage—208 VAC[2]
Process type—Magnetron sputtering[3]
Deposition mode—DC & RF sputtering[3]
Substrate size—4-inch diameter[3]
Footprint—Less than 36 inches (914 mm) of desk space[3]
Vacuum capability—High vacuum, 10^-6 torr range[3]
Pump-down time—Less than 30 minutes[3]
Cathodes—Up to two 2.0-inch diameter magnetrons[4]
Substrate stage—Rotating substrate stage[3]
Applications—Sputtering, materials research, product QC & QA, semiconductor failure analysis, nanotechnology, compound semiconductors[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]dentonvacuum.comdentonvacuum.com
  4. [4]info.dentonvacuum.cominfo.dentonvacuum.com