Waferpedia

Comparison ledger

0020 18455 PartversusGasonics Triple Speed NF

Applied Materials 0020 18455 Part, Lam Research Gasonics Triple Speed NF, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18455 PartApplied Materials
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18455 PartLam Research Gasonics
Specifications
ConfigurationShaft,Rf In Local Match, Hdpcvd,Rev3[1]3 ch (HDP)[2]
Process type—Chemical Vapor Deposition (CVD)[2]
Number of chambers—3 (HDP)[2]
Robot—Brooks robot[2]
SLM type—SLM type[2]
Ports—3 port[2]
Loadlock helium reduction—loadlock helium reduction[2]
Vintage year—2008[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing