Comparison ledger
Applied Materials 0010 47763, Lam Research 2300 V 2 Kiyo 45, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | 2300 V 2 Kiyo 45Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research 2300 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | 2nd Source New[4] | Polysilicon[1] |
| Type | Monopolar Dual Heated[5] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[6] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[5] | — |
| Model | 0010-47763[4] | 2300 V 2 Kiyo 45[7] |
| OEM | Applied Materials[4] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[5] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[5] | — |
| Quantity available (source) | 1[5] | — |
| Process capability | — | Polysilicon[1] |
| Chamber configuration | — | 4ch (4-channel)[1] |
| Process gases | — | SiCl4, BCl3, HBr, CH4, CHF3, Cl2, CH2F2, CH3F, NF3, O2, CF4, He, Ar, N2[1] |
| Vacuum pump | — | Edwards STP XA2703CV[1] |
| Make | — | Lam[7] |
| Category | — | Etcher[7] |
| Process | — | Polysilicon etching[1] |
| Number of Chambers | — | 4ch[1] |
| Gas Chemistry | — | SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1] |
| Pump | — | Edwards STP XA2703CV[1] |
| Number of chambers | — | 4[1] |
| Process chambers | — | 4[1] |
| Process Type | — | Polysilicon[1] |
| Chamber Count | — | 4[1] |
| Supported Gases | — | SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1] |
| Vintage (some units) | — | 2007, 2008, 2009[2] |
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