Comparison ledger
Applied Materials 0010 47763, Applied Materials Centura II, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | Centura IIApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Applied Materials Centura |
| Cited variants | — |
|
| Specifications | ||
| Configuration | 2nd Source New[2] | DPS + Metal[5] |
| Type | Monopolar Dual Heated[3] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[4] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[3] | — |
| Model | 0010-47763[2] | Centura II[1] |
| OEM | Applied Materials[2] | Applied Materials[1] |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[3] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[3] | Poly / Metal / Oxide etch[6] |
| Quantity available (source) | 1[3] | — |
| Category | — | Etch[1] |
| Wafer sizes | — | 6 inch[5] |
| Configuration / options | — | DPS + Metal[1] |
| Chamber | — | DPS II / DPS / Super E / eMxP+ / MxP+ / MxP / eMAX[6] |
| Wafer size | — | 6 inch[5] |
| Chamber options | — | DPS II, DPS, Super E, eMxP+, MxP+, MxP, eMAX[1] |
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