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0010-22161 High EFF RF MatchversusFLX 2908 Thin Film Stress Measurement

Applied Materials 0010-22161 High EFF RF Match, KLA FLX 2908 Thin Film Stress Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsKLA
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
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Control system——
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FamilyApplied Materials 0010-22161 High EFF RF MatchKLA FLX 2908 Thin Film Stress Measurement
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]—
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Wafer size—8 inch[3]
Power supply—230V, 15A, 1Ph, 50Hz[4]
Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]Equipment inventory listing
  4. [4]semistarcorp.comsemistarcorp.com