Waferpedia

Comparison ledger

0010-21246 PartversusDelta 12 AQ Spin

Applied Materials 0010-21246 Part, SUSS MicroTec Delta 12 AQ Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-21246 PartApplied Materials
Delta 12 AQ SpinSUSS MicroTec
OEMApplied MaterialsSUSS MicroTec
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—SUSS MicroTec Delta 12 AQ Spin
Specifications
Maximum wafer diameter—200 mm[1]
Maximum substrate thickness—5 mm[1]
Supported wafer diameters—50 mm, 75 mm, 100 mm, 150 mm, 200 mm[1]
Supported photomask sizes—125 mm x 125 mm, 150 mm x 150 mm[1]
Supported developer chemistries—AZ400K, AZ300MIF, CD26[1]
Operation type—Recipe controlled automated operation[1]
Developer temperature control—Precise control[1]
Substrate handling—Cassette-to-cassette dry in-dry out[1]
Sources (1)Every fact above is drawn from these public sources
  1. [1]nist.govnist.gov