Waferpedia

Comparison ledger

0010-21246 PartversusACS 200 Spin

Applied Materials 0010-21246 Part, SUSS MicroTec ACS 200 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-21246 PartApplied Materials
ACS 200 SpinSUSS MicroTec
OEMApplied MaterialsSUSS MicroTec
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—SUSS MicroTec ACS 200 Spin
Cited variants—
Specifications
Maximum wafer diameter—200 mm (8 in)[2]
Maximum substrate thickness—5 mm[2]
Wafer diameters supported—50 mm, 75 mm, 100 mm, 150 mm, 200 mm[2]
Photomask sizes supported—125 mm x 125 mm, 150 mm x 150 mm[2]
Coating modules—Gyrset spin coat; Alta spray coat[2]
Hotplate maximum temperature—250 °C[2]
Edge-bead removal—Automated with backside rinse[2]
Small pieces supported—Yes[2]
Sources (2)Every fact above is drawn from these public sources
  1. [1]doi.orgdoi.org
  2. [2]nist.govnist.gov