Comparison ledger
Applied Materials 0010-21246 Part, Applied Materials MxP+ Poly, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-21246 PartApplied Materials | MxP+ PolyApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Applied Materials MxP+ Poly |
| Cited variants | — |
|
| Specifications | ||
| Wafer Size | — | 200mm[2] |
| Platform | — | Centura 5200[2] |
| Process Type | — | Polysilicon Etch[2] |
| Date of Manufacture | — | 1998[2] |
| Software Version | — | 4.9_15[2] |
| Orienter Quantity | — | 1[2] |
| MxP Poly Quantity | — | 1[2] |
| MxP+ Poly Quantity | — | 2[2] |
| eMxP+ ESC Quantity | — | 1[2] |
| End Point Detection | — | Monochromator[2] |
| Gases Used | — | NF3, CH3F, CL2, HBR, CHF3, AR, CF4, O2, N2, C4F8, CO, HE/O2[2] |
| MFCs | — | 32 Digital MFC's[2] |
| Robot | — | HP Robot[2] |
| Dry Pumps | — | 4-IQDP80, 2-IQDP80/WSU151[2] |
| Chillers | — | 5-Neslab-150[2] |
| Wafer Size (Asseta) | — | 6"[1] |
| ESC Type | — | Polymide[2] |