Comparison ledger
Applied Materials 0010-14300 Magnet Assy, Varian EHPI 500, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-14300 Magnet AssyApplied Materials | EHPI 500Varian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-14300 Magnet Assy | Varian EHPI 500 |
| Specifications | ||
| Configuration | P4 Magnet Assy, IMP[1] | Medium Current[2] |
| Gearbox P/N | 0010-27417[1] | — |
| Part Number | 0010-14300[1] | — |
| Description | P4 Magnet Assy, IMP[1] | — |
| Tool type | — | Medium current ion implanter[3] |
| Energy range (single charge, X+) | — | 5 – 260 keV[3] |
| Energy range (extended) | — | up to 780 keV[3] |
| Maximum wafer size | — | 200 mm (8 in)[3] |
| Minimum feature size | — | 0.18 µm[3] |
| Throughput | — | Highest industry throughput among medium current implanters (10% higher maximum throughput than previous E-series)[3] |
| Upgrade / Extensions | — | BDM (Beam Drift Monitors)[4] |
| Consumables at end of lifetime | — | source electrode[4] |
| Contamination Known | — | BF3, ASH 3, PH 3[4] |
| Energy range | — | up to 780 keV[3] |
| Wafer size | — | up to 200 mm[3] |
| Throughput increase | — | 10% higher maximum throughput[3] |
| Manufacturer | — | Varian[5] |
| Model | — | EHPI 500[5] |
| Equipment type | — | Implanter[5] |
| Process class | — | Medium current ion implanter[2] |
| Expanded energy range | — | up to 780 keV[3] |
| Maximum throughput change | — | 10% higher maximum throughputs[3] |
| Feature size capability | — | down to 0.18 micron[3] |
| Wafer size capability | — | up to 200mm[3] |
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