Comparison ledger
Applied Materials 0010-13622 RF Match for, Oxford Instruments 80 Plus, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | 80 PlusOxford Instruments |
|---|---|---|
| OEM | Applied Materials | Oxford Instruments |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Oxford Instruments 80 Plus |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | 50/60 Hz[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Phase | — | 3 Phase[2] |
| Voltage | — | 415 vAC[2] |
| Process type | — | Plasma-enhanced chemical vapor deposition (PECVD)[3] |
| Maximum wafer size | — | 8 inches (200 mm)[3] |
| Maximum temperature | — | 400 °C[3] |
| RF generator power | — | 300W at 13.56 MHz[3] |
| Available gases | — | SiH4, NH3, N2O, N2, O2, CF4[3] |
| Total gas flow range | — | 150 – 3000 sccm[3] |
| Pressure range | — | 200 – 2000 mTorr[3] |
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