Comparison ledger
Applied Materials 0010-13622 RF Match for, Lam Research Concept Three Speed, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Concept Three SpeedLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Lam Research Concept Three |
| Cited variants | — |
|
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[2] | Triple Speed NF[1] |
| Model | 0010-13622[2] | Concept Three Speed[3] |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[2] | — |
| Feature | High Efficiency HE RF Match-Bias[2] | — |
| Speed Handler Type | — | WTS IMM[1] |
| Primary User Interface | — | Flat Panel Right[1] |
| WTS Vacuum PEC Location | — | Port 5[1] |
| Module A Location | — | Port 2[1] |
| Module B Location | — | Port 3[1] |
| Module C Location | — | Port 4[1] |
| Handler Facilities | — | Bottom[1] |
| Interconnect Cable | — | Length 75 Feet[1] |
| Software Version | — | 5.73[1] |
| Software Build | — | 78[1] |
| Operating System | — | Windows XP/2000[1] |
| User Interface Type | — | Ballroom[1] |
| Signal Tower Operation | — | 3 Color Light Tower(RYG)[1] |
| FOUP ID Reader Type | — | OMRON[1] |
| ATM Robot End Effector | — | Vacuum[1] |
| OEM | — | Lam / Novellus[3] |
| Process | — | CVD (Chemical Vapor Deposition)[3] |
| Wafer Size | — | 12 inch[3] |
| Vintage | — | 2005[3] |
| Interconnect Cable Length | — | 75 Feet[1] |
| Front End Robot Type | — | Brooks ATR 8[1] |
| TM Robot Type | — | Brooks Mag 7[1] |
| IMM Readiness Option | — | No[1] |
| FA Communication Interface | — | No[1] |
| Handler Leak Check Shut Off Valve | — | No[1] |
| Make | — | Lam / Novellus[3] |
| Equipment type | — | CVD (Chemical Vapor Deposition)[3] |
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