Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusR-D1

Applied Materials 0010-03485 Magnet Assy, Seiko Epson R-D1, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
R-D1Seiko Epson
OEMApplied MaterialsSeiko Epson
Category——
Wafer size——
Process node——
Introduced—2004
Production run—2004–
Lifecycle—Discontinued
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssySeiko Epson R-D1
Cited variants—
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Lens mount—Leica M mount, Leica M39 mount (with adapter ring)[1]
Crop factor—1.53[1]
Sources (5)Every fact above is drawn from these public sources
  1. [1]en.wikipedia.orgen.wikipedia.org
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com