Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Pfeiffer ADS 602 H, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | ADS 602 HPfeiffer |
|---|---|---|
| OEM | Applied Materials | Pfeiffer |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Pfeiffer ADS 602 H |
| Cited variants | — | |
| Specifications | ||
| Configuration | WP AL 300mm PVD[2] | — |
| OEM | Applied Materials[2] | — |
| Model | 0010-03485[2] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[3] | — |
| Process | PVD[4] | — |
| Wafer size | 300mm[5] | — |
| Version | Spares[5] | — |
| Part Number | 0010-03485[2] | — |
| Manufacturer | Applied Materials[2] | — |
| Process Type | PVD (Physical Vapor Deposition)[2] | — |
| Application (Material) | Aluminum (AL)[2] | — |
| Wafer Diameter (associated) | 300 mm[2] | — |
| Type | — | Multistage Roots dry pump[6] |
| Ultimate Pressure (60 Hz) | — | 5×10⁻⁴ mbar[1] |
| Ultimate Pressure (50 Hz) | — | 8×10⁻⁴ mbar[1] |
| Nominal Flow Rate (50 Hz, without converter) | — | 480 m³/h[1] |
| Nominal Flow Rate (60 Hz, without converter) | — | 560 m³/h[1] |
| Nominal Power | — | 3 kW[1] |
| Supply Voltage | — | 3 Ph 200/480 V[1] |
| Max Continuous Inlet Pressure | — | 10 mbar[1] |
| N2 Purge Flow Rate | — | 0 to 50 sl/mn[1] |
| Cooling Water Flow Rate | — | 60 l/h[1] |
| Cooling Water Input Temperature Range | — | +10°C to +35°C[6] |
| Rotation Speed | — | 3000 to 3600 rpm[1] |
| Ambient Temperature Range | — | 5 to 40°C[1] |
| Inlet Port | — | DN 100 ISO-K[1] |
| Exhaust Port | — | DN 40 ISO-KF[1] |
| Weight | — | 400 kg[1] |