Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Perkin Elmer 11 067 Ion Gun Control, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | 11 067 Ion Gun ControlPerkin Elmer |
|---|---|---|
| OEM | Applied Materials | Perkin Elmer |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Perkin Elmer 11 067 Ion Gun Control |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Beam voltage range | — | 0 to +5000 volts DC[5] |
| Focus ratio | — | 70-100% of beam voltage[5] |
| Minimum focus voltage | — | 100 volts DC[5] |
| Raster amplitude | — | 0 to +200 volts peak-to-peak[5] |
| Pressure range | — | 0-50 mP[5] |
| Anode current | — | 25 uA at 50 mP[5] |
| Output current | — | 50 mA[5] |
| Stability | — | 1% per hour[5] |
| Ripple | — | 0.2 V peak-to-peak[5] |